History

2007.08

High-end lithography exposure optical system project demonstration team built in the National Key Laboratory of Applied Optics.

2009.07

The team won the national projection objective research and development project. China's high-end lithography exposure optical system has entered the stage of technology research and development.

2013.09

Exposure optical system has entered the stage of manufacturing.

2014.08

Changchun National Extreme Precision Optics Co., Ltd.(CNEPO) was incorporated.

2016.01

The company won the support of the national projection objective research and development project again.

2016.09

The first NA0.75 lithography projection lens passed the test on the whole machine and acquired acceptance.

2017.04

The first NA0.75 lithography illumination system in China passed system performance test on the whole machine and acquired acceptance.