Epolith A075 is the first advanced exposure optical system at 90-nanometer process with all independent intellectual property rights in our country which is one of the core research achievements of the National Science and Technology Major Project (02 Major Project ).
Characteristic Description
The first exposure optical system at 90-nanometer process in China, ArF laser light source, NA0.75, large field of view, high speed dynamic compensation, off-axis illumination, high uniformity illumination
Parameters
Model | Epolith A075 |
| Central Wavelength | 193nm |
| NA(image space) | 0.75 |
| Resolution | 90nm |
| Field Size | 26mm×10.5mm |
| Wavefront Error | ≤5.1nm |
| Distortion | ≤5.7 nm |
Exposure Results
Ø Resolution test: 90nm dense line, L/S (line and space ratio) is 1:1, Pitch is 180nm
90nm dense line measured by SEM (scanning electron micorscope) Top view of 85nm horizontal / vertical dense line
Ø LER (Line edge roughness) test: 90nm line edge roughness LER~5.0nm
Domestic equipment SSA600
LER 4.9nm@BF
