It is mainly used in the development of highly-complex and extreme-precise optical systems such as exposure systems of lithography tools used in advanced IC manufacturing industry, of which the outstanding feature is that the surface manufacturing accuracy of the full-band of the optical components should meet the magnitude of deep sub-nanometer. Only a few top optical companies such as Zeiss and Nikon have mastered such technologies. Applications: IC manufacturing equipment, medical microscopy, advanced projection display.
To detect early insulation damage discharge of high-voltage electrical equipment at all time with early damage warning and positioning functions, the R&D team has continuously undertaken several national 863 projects, led the research and development of the solar blind ultraviolet radiation calibration platform, high-performance home-made solar blind ultraviolet matrix detector, optical filter and solar blind ultraviolet imager. Application: Power generation/ transmission/ transformation/ distribution network, electrified railway/subway, high voltage scientific research.